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Wafer thickness measuring instrument
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Wafer thickness measuring instrument

Wafer thickness measuring instrument

This device measures the thickness of wafers and display panels after partial processes such as wafer slicing, grinding, thinning, and slicing. Can synchronously test the TTVBOWWRAP/SORI and other parameter errors of the material itself.

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Performance index

Use ceramic disc size

φ260/268/305/360mm Automated loading and unloading of robotic arms

Equipment measurement resolution

0.005um

Measurement repeatability

0.5um

Measurement accuracy 

1um (measurement comparison accuracy is affected by ceramic disc and wax layer)

Measuring range 

0-1000um

Number of measurement points

1. 3, 5, 9... N (number of points can be set)

Measurement efficiency

Fastest 18sec/p, 5-point sampling

Measure bandwidth

Max 10000Point/sec

Measure material

Transparent, non transparent, smooth, rough samples such as GaN, GaAs, Si, SiN, Sic, etc

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